Skip to main navigation Skip to search Skip to main content

Analysis of the reset transition in bipolar HfO2-based ReRAM to improve modeling accuracy

  • ISEP
  • Université de Toulon
  • Universidad San Francisco de Quito

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

A complete analysis of the two-step reset transition observed in the current-voltage curves of HfO2-based ReRAM devices is presented. Five electrical parameters are extracted from experimental and intrinsic curves, and after, they are statistically analyzed and compared among devices of different areas. The results are interpreted by accounting for filamentary resistive switching operation. Finally, we propose a modification to the stochastic model for OxRAM memories presented in [1] to improve the simulation results in the reset region.

Original languageEnglish
Title of host publication2022 IEEE Latin America Electron Devices Conference, LAEDC 2022
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665497671
DOIs
StatePublished - 2022
Event2022 IEEE Latin America Electron Devices Conference, LAEDC 2022 - Cancun, Mexico
Duration: 4 Jul 20226 Jul 2022

Publication series

Name2022 IEEE Latin America Electron Devices Conference, LAEDC 2022

Conference

Conference2022 IEEE Latin America Electron Devices Conference, LAEDC 2022
Country/TerritoryMexico
CityCancun
Period4/07/226/07/22

Keywords

  • ReRAM
  • conductive filament
  • filamentary conduction
  • reset
  • stochastic model
  • switching
  • two-step transition

Fingerprint

Dive into the research topics of 'Analysis of the reset transition in bipolar HfO2-based ReRAM to improve modeling accuracy'. Together they form a unique fingerprint.

Cite this