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On the parameter extraction of short channel UTBB-FDSOI FET's with high-κ metal gate and TCAD modelling

  • Universidad San Francisco de Quito

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

In this work an extraction method is proposed to obtain the electric and physical parameters of Ultra-Thin Body and Buried Oxide (UTBB) Fully Depleted SOI MOSFET with short channel length (below 100 nm). In order to check the accuracy of the extraction method, model is built using a TCAD with these parameters. We found that the simulation shows a very good agreement with the experimental curves. However, an improvement of the mobility model and a better definition of the extension of the model used in the TCAD is needed to get a perfect matching between the experimental and the simulated curves.

Original languageEnglish
Title of host publicationProceedings of the 2018 IEEE 25th International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538654903
DOIs
StatePublished - 6 Nov 2018
Event25th IEEE International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018 - Lima, Peru
Duration: 8 Aug 201810 Aug 2018

Publication series

NameProceedings of the 2018 IEEE 25th International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018

Conference

Conference25th IEEE International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018
Country/TerritoryPeru
CityLima
Period8/08/1810/08/18

Keywords

  • MOSFET
  • TCAD
  • UTTB-FDSOI
  • high-κ
  • modelling
  • parameter extraction
  • parasitic components
  • short channel

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