Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN

L. Pantisano; L. Trojman; S. Severi; E. San Andres; C. Kerner; A. Veloso; I. Ferain; T. Hoffman; G. Groeseneken; S. De Gendt

doi:10.1109/VTSA.2007.378909

Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN

L. Pantisano, L. Trojman, S. Severi, E. San Andres, C. Kerner, A. Veloso, I. Ferain, T. Hoffman, G. Groeseneken, S. De Gendt

Universidad San Francisco de Quito USFQ

Interuniversitair Micro-Elektronica Centrum

Producción científica: Capítulo del libro/informe/acta de congreso › Contribución a la conferencia › revisión exhaustiva

Idioma original	Inglés
Título de la publicación alojada	2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers
DOI	https://doi.org/10.1109/VTSA.2007.378909
Estado	Publicada - 2007
Evento	2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Hsinchu, Taiwán Duración: 23 abr. 2007 → 25 abr. 2007

Serie de la publicación

Nombre	International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Conferencia

Conferencia	2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA
País/Territorio	Taiwán
Ciudad	Hsinchu
Período	23/04/07 → 25/04/07

Acceder al documento

10.1109/VTSA.2007.378909

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Enlace a la publicación en Scopus

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Pantisano, L., Trojman, L., Severi, S., San Andres, E., Kerner, C., Veloso, A., Ferain, I., Hoffman, T., Groeseneken, G., & De Gendt, S. (2007). Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. En 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers Artículo 4239477 (International Symposium on VLSI Technology, Systems, and Applications, Proceedings). https://doi.org/10.1109/VTSA.2007.378909

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title = "Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN",

author = "L. Pantisano and L. Trojman and S. Severi and {San Andres}, E. and C. Kerner and A. Veloso and I. Ferain and T. Hoffman and G. Groeseneken and {De Gendt}, S.",

year = "2007",

doi = "10.1109/VTSA.2007.378909",

language = "Ingl{\'e}s",

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series = "International Symposium on VLSI Technology, Systems, and Applications, Proceedings",

booktitle = "2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers",

note = "2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA ; Conference date: 23-04-2007 Through 25-04-2007",

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Pantisano, L, Trojman, L, Severi, S, San Andres, E, Kerner, C, Veloso, A, Ferain, I, Hoffman, T, Groeseneken, G & De Gendt, S 2007, Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. En 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers., 4239477, International Symposium on VLSI Technology, Systems, and Applications, Proceedings, 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA, Hsinchu, Taiwán, 23/04/07. https://doi.org/10.1109/VTSA.2007.378909

Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. / Pantisano, L.; Trojman, L.; Severi, S. et al.
2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers. 2007. 4239477 (International Symposium on VLSI Technology, Systems, and Applications, Proceedings).

Producción científica: Capítulo del libro/informe/acta de congreso › Contribución a la conferencia › revisión exhaustiva

TY - GEN

T1 - Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN

AU - Pantisano, L.

AU - Trojman, L.

AU - Severi, S.

AU - San Andres, E.

AU - Kerner, C.

AU - Veloso, A.

AU - Ferain, I.

AU - Hoffman, T.

AU - Groeseneken, G.

AU - De Gendt, S.

PY - 2007

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DO - 10.1109/VTSA.2007.378909

M3 - Contribución a la conferencia

AN - SCOPUS:34548843898

SN - 1424405858

SN - 9781424405855

T3 - International Symposium on VLSI Technology, Systems, and Applications, Proceedings

BT - 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers

T2 - 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA

Y2 - 23 April 2007 through 25 April 2007

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Pantisano L, Trojman L, Severi S, San Andres E, Kerner C, Veloso A et al. Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. En 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers. 2007. 4239477. (International Symposium on VLSI Technology, Systems, and Applications, Proceedings). doi: 10.1109/VTSA.2007.378909