Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN

L. Pantisano; L. Trojman; S. Severi; E. San Andres; C. Kerner; A. Veloso; I. Ferain; T. Hoffman; G. Groeseneken; S. De Gendt

doi:10.1109/VTSA.2007.378909

Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN

L. Pantisano^*
, L. Trojman
, S. Severi
, E. San Andres
, C. Kerner
, A. Veloso
, I. Ferain
, T. Hoffman
, G. Groeseneken
, S. De Gendt

^*Autor correspondiente de este trabajo

Universidad San Francisco de Quito USFQ

Interuniversitair Micro-Elektronica Centrum

Producción científica: Capítulo del libro/informe/acta de congreso › Contribución a la conferencia › revisión exhaustiva

Idioma original	Inglés
Título de la publicación alojada	2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers
DOI	https://doi.org/10.1109/VTSA.2007.378909
Estado	Publicada - 2007
Evento	2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Hsinchu, Taiwán Duración: 23 abr. 2007 → 25 abr. 2007

Serie de la publicación

Nombre	International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Conferencia

Conferencia	2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA
País/Territorio	Taiwán
Ciudad	Hsinchu
Período	23/04/07 → 25/04/07

Acceder al documento

10.1109/VTSA.2007.378909

Otros archivos y enlaces

Enlace a la publicación en Scopus

Citar esto

Pantisano, L., Trojman, L., Severi, S., San Andres, E., Kerner, C., Veloso, A., Ferain, I., Hoffman, T., Groeseneken, G., & De Gendt, S. (2007). Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. En 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers Artículo 4239477 (International Symposium on VLSI Technology, Systems, and Applications, Proceedings). https://doi.org/10.1109/VTSA.2007.378909

@inproceedings{6c6f56bfae9544579db370008af1b224,

title = "Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN",

author = "L. Pantisano and L. Trojman and S. Severi and \{San Andres\}, E. and C. Kerner and A. Veloso and I. Ferain and T. Hoffman and G. Groeseneken and \{De Gendt\}, S.",

year = "2007",

doi = "10.1109/VTSA.2007.378909",

language = "Ingl{\'e}s",

isbn = "1424405858",

series = "International Symposium on VLSI Technology, Systems, and Applications, Proceedings",

booktitle = "2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers",

note = "2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA ; Conference date: 23-04-2007 Through 25-04-2007",

}

Pantisano, L, Trojman, L, Severi, S, San Andres, E, Kerner, C, Veloso, A, Ferain, I, Hoffman, T, Groeseneken, G & De Gendt, S 2007, Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. En 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers., 4239477, International Symposium on VLSI Technology, Systems, and Applications, Proceedings, 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA, Hsinchu, Taiwán, 23/04/07. https://doi.org/10.1109/VTSA.2007.378909

Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. / Pantisano, L.; Trojman, L.; Severi, S. et al.
2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers. 2007. 4239477 (International Symposium on VLSI Technology, Systems, and Applications, Proceedings).

Producción científica: Capítulo del libro/informe/acta de congreso › Contribución a la conferencia › revisión exhaustiva

TY - GEN

T1 - Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN

AU - Pantisano, L.

AU - Trojman, L.

AU - Severi, S.

AU - San Andres, E.

AU - Kerner, C.

AU - Veloso, A.

AU - Ferain, I.

AU - Hoffman, T.

AU - Groeseneken, G.

AU - De Gendt, S.

PY - 2007

Y1 - 2007

UR - https://www.scopus.com/pages/publications/34548843898

U2 - 10.1109/VTSA.2007.378909

DO - 10.1109/VTSA.2007.378909

M3 - Contribución a la conferencia

AN - SCOPUS:34548843898

SN - 1424405858

SN - 9781424405855

T3 - International Symposium on VLSI Technology, Systems, and Applications, Proceedings

BT - 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers

T2 - 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA

Y2 - 23 April 2007 through 25 April 2007

ER -

Pantisano L, Trojman L, Severi S, San Andres E, Kerner C, Veloso A et al. Line width dependent mobility in high-k - A comparative performance study between FUSI and TiN. En 2007 International Symposium on VLSI Technology, Systems and Applications, VLSI-TSA - Proceedings of Technical Papers. 2007. 4239477. (International Symposium on VLSI Technology, Systems, and Applications, Proceedings). doi: 10.1109/VTSA.2007.378909