On the parameter extraction of short channel UTBB-FDSOI FET's with high-κ metal gate and TCAD modelling

Lionel Trojman, Andres Vaca, Luis Miguel Procel

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Resumen

In this work an extraction method is proposed to obtain the electric and physical parameters of Ultra-Thin Body and Buried Oxide (UTBB) Fully Depleted SOI MOSFET with short channel length (below 100 nm). In order to check the accuracy of the extraction method, model is built using a TCAD with these parameters. We found that the simulation shows a very good agreement with the experimental curves. However, an improvement of the mobility model and a better definition of the extension of the model used in the TCAD is needed to get a perfect matching between the experimental and the simulated curves.

Idioma originalInglés
Título de la publicación alojadaProceedings of the 2018 IEEE 25th International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018
EditorialInstitute of Electrical and Electronics Engineers Inc.
ISBN (versión digital)9781538654903
DOI
EstadoPublicada - 6 nov. 2018
Evento25th IEEE International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018 - Lima, Perú
Duración: 8 ago. 201810 ago. 2018

Serie de la publicación

NombreProceedings of the 2018 IEEE 25th International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018

Conferencia

Conferencia25th IEEE International Conference on Electronics, Electrical Engineering and Computing, INTERCON 2018
País/TerritorioPerú
CiudadLima
Período8/08/1810/08/18

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