Resumen
This paper explores the impact on reliability and energy-efficiency in double-barrier magnetic tunnel junctions (DMTJs)-based smart material implication (SIMPLY) scheme operating at cryogenic temperatures (77 K). Our study is carried out through a macrospin-based Verilog-A compact model of DMTJ, along with a 65 nm commercial process design kit (PDK) calibrated down to 77 K under silicon measurements. This study evaluates the effects of adjusting the bias voltage. Energy-efficient SIMPLY operations can be achieved by relaxing the bias voltage, and thereby the read sensing margins. DMTJ-based SIMPLY and sFALSE schemes allows energy savings of about 29.2% and 35%, respectively. We then utilized the SIMPLY and sFALSE logic schemes to assess energy savings in logic operations. These results indicate that DMTJ-based cells under cryogenic conditions are a promising alternative for logic-in-memory (LiM) architectures.
| Idioma original | Inglés |
|---|---|
| Título de la publicación alojada | ETCM 2024 - 8th Ecuador Technical Chapters Meeting |
| Editores | David Rivas-Lalaleo, Soraya Lucia Sinche Maita |
| Editorial | Institute of Electrical and Electronics Engineers Inc. |
| ISBN (versión digital) | 9798350391589 |
| DOI | |
| Estado | Publicada - 2024 |
| Evento | 8th IEEE Ecuador Technical Chapters Meeting, ETCM 2024 - Cuenca, Ecuador Duración: 15 oct. 2024 → 18 oct. 2024 |
Serie de la publicación
| Nombre | ETCM 2024 - 8th Ecuador Technical Chapters Meeting |
|---|
Conferencia
| Conferencia | 8th IEEE Ecuador Technical Chapters Meeting, ETCM 2024 |
|---|---|
| País/Territorio | Ecuador |
| Ciudad | Cuenca |
| Período | 15/10/24 → 18/10/24 |
ODS de las Naciones Unidas
Este resultado contribuye a los siguientes Objetivos de Desarrollo Sostenible
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ODS 7: Energía asequible y no contaminante
Huella
Profundice en los temas de investigación de 'Relaxing Sensing Margins in Double-Barrier Magnetic Tunnel Junction for Energy-Efficient Smart Material Implication (SIMPLY) Scheme Operating at 77K'. En conjunto forman una huella única.Citar esto
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