Sliding-Mode Controller Based on Fractional Order Calculus for Chemical Processes

Antonio Di Teodoro, Diego Ochoa-Tocachi, Hanna Aboukheir, Oscar Camacho

Producción científica: Capítulo del libro/informe/acta de congresoContribución a la conferenciarevisión exhaustiva

1 Cita (Scopus)

Resumen

This study uses a fractional FOPDT model of the actual process to create a fractional sliding mode controller. Nonlinear chemical processes may be studied using the new methodology. The real chemical systems are described and represented by the controller design using the power of fractional order calculus as a reduced order model. From this model, the controller is developed using the sliding mode control process. An SMC based on FOPDT and the new method are compared using a higher order plus deadtime model. Lastly, some performance indicators are used to evaluate performance and robustness quantitatively.

Idioma originalInglés
Título de la publicación alojada2022 IEEE International Conference on Automation/25th Congress of the Chilean Association of Automatic Control
Subtítulo de la publicación alojadaFor the Development of Sustainable Agricultural Systems, ICA-ACCA 2022
EditorialInstitute of Electrical and Electronics Engineers Inc.
ISBN (versión digital)9781665494083
DOI
EstadoPublicada - 2022
Evento2022 IEEE International Conference on Automation/25th Congress of the Chilean Association of Automatic Control, ICA-ACCA 2022 - Virtual, Online, Chile
Duración: 24 oct. 202228 oct. 2022

Serie de la publicación

Nombre2022 IEEE International Conference on Automation/25th Congress of the Chilean Association of Automatic Control: For the Development of Sustainable Agricultural Systems, ICA-ACCA 2022

Conferencia

Conferencia2022 IEEE International Conference on Automation/25th Congress of the Chilean Association of Automatic Control, ICA-ACCA 2022
País/TerritorioChile
CiudadVirtual, Online
Período24/10/2228/10/22

Huella

Profundice en los temas de investigación de 'Sliding-Mode Controller Based on Fractional Order Calculus for Chemical Processes'. En conjunto forman una huella única.

Citar esto